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dc.creatorQuintero J.H.spa
dc.creatorOspina R.spa
dc.creatorMello A.spa
dc.date.accessioned2016-07-27T21:52:39Z
dc.date.available2016-07-27T21:52:39Z
dc.date.created2016
dc.identifier.issn17426588
dc.identifier.urihttp://hdl.handle.net/11407/2482
dc.description.abstract4d and 5d series of the transition metals are used to the obtaining nitrides metallic, due to the synthesis of PtN, AgN and AuN in the last years. Different nitrides are obtained in the Plasma Assisted Physics Vapour Deposition system, due to its ionization energy which is necessary for their formation. In this paper a Magnetron Sputtering system was used to obtain Au thin films on Si wafers in Nitrogen atmosphere. The substrate temperature was varied between 500 to 950°C. The samples obtained at high temperatures (>500°C) show Au, Si and N elements, as it is corroborated in the narrow spectrum obtained for X-Ray Photoelectron Spectroscopy; besides the competition of orientation crystallographic texture between (111) and (311) directions was present in the X-Ray Diffraction analysis to the sample heated at 950°C.eng
dc.language.isoeng
dc.publisherInstitute of Physics Publishingspa
dc.relation.isversionofhttp://iopscience.iop.org/article/10.1088/1742-6596/687/1/012006/metaspa
dc.sourceScopusspa
dc.titleObtaining Au thin films in atmosphere of reactive nitrogen through magnetron sputteringspa
dc.typeConference Papereng
dc.rights.accessrightsinfo:eu-repo/semantics/restrictedAccess
dc.rights.accessrightsinfo:eu-repo/semantics/restrictedAccess
dc.contributor.affiliationQuintero, J.H., Universidad de Medellín, Medellín, Colombiaspa
dc.contributor.affiliationOspina, R., Centro Brasileiro de Pesquisas Físicas (CBPF), Rio de Janeiro, Brazilspa
dc.contributor.affiliationMello, A., Centro Brasileiro de Pesquisas Físicas (CBPF), Rio de Janeiro, Brazilspa
dc.identifier.doi10.1088/1742-6596/687/1/012006
dc.abstract4d and 5d series of the transition metals are used to the obtaining nitrides metallic, due to the synthesis of PtN, AgN and AuN in the last years. Different nitrides are obtained in the Plasma Assisted Physics Vapour Deposition system, due to its ionization energy which is necessary for their formation. In this paper a Magnetron Sputtering system was used to obtain Au thin films on Si wafers in Nitrogen atmosphere. The substrate temperature was varied between 500 to 950°C. The samples obtained at high temperatures (>500°C) show Au, Si and N elements, as it is corroborated in the narrow spectrum obtained for X-Ray Photoelectron Spectroscopy; besides the competition of orientation crystallographic texture between (111) and (311) directions was present in the X-Ray Diffraction analysis to the sample heated at 950°C.eng
dc.creator.affiliationUniversidad de Medellín, Medellín, Colombiaspa
dc.creator.affiliationCentro Brasileiro de Pesquisas Físicas (CBPF), Rio de Janeiro, Brazilspa
dc.relation.ispartofenJournal of Physics: Conference Series 687 (2016) 012006eng
dc.type.driverinfo:eu-repo/semantics/conferenceObject


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