Influence of nitrogen partial pressure on the microstructure and morphological properties of sputtered RuN coatings
Materiales Nanoestructurados y Biomodelación Universidad de Medellín Medellín Colombia
Centro Brasilero de Pesquisas Fisica-CBPF Rio de Janeiro Brazil
Laboratorio de Física del Plasma Universidad Nacional de Colombia Manizales Colombia
Escuela de Física, Centro de Materiales y Nanociencia Universidad Industrial de Santander Bucaramanga Colombia
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In this work, the production of RuN thin films using the reactive direct current magnetron sputtering technique is presented. Samples were grown with varying Ar/N2 ratio with values of 60/40, 80/20, 85/15, 90/10, 95/5, and 100/0. X-ray photoelectron spectroscopy was employed to determine the presence of RuN before and after a sputtering etching process. According to the high-resolution of N1s spectra, 3 peaks were identified at 397.4±0.3 eV, 398.3±0.3 eV, and 398.8±0.3 eV binding energies, corresponding to hybridizations of nitrogen with transition metals, oxynitrides, and oxycarbides. X-ray diffraction analyses were performed, showing the coexistence of the RuN face-centered cubic and Ru hexagonal compact packed phases. After the etching process, the samples grown at nitrogen flow rates greater than 15% continued to show the RuN face-centered cubic phase. Atomic force microscope analyses showed that as the nitrogen concentration increased, the grain size and roughness also tended to increase. © 2017 John Wiley & Sons, Ltd.
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