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Influence of nitrogen partial pressure on the microstructure and morphological properties of sputtered RuN coatings

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Date
2017
Author
Quintero J.H.
Ospina R.
Mello A.
Escobar D.
Restrepo-Parra E.
Materiales Nanoestructurados y Biomodelación Universidad de Medellín Medellín Colombia
Centro Brasilero de Pesquisas Fisica-CBPF Rio de Janeiro Brazil
Laboratorio de Física del Plasma Universidad Nacional de Colombia Manizales Colombia
Escuela de Física, Centro de Materiales y Nanociencia Universidad Industrial de Santander Bucaramanga Colombia

Citación

       
TY - GEN T1 - Influence of nitrogen partial pressure on the microstructure and morphological properties of sputtered RuN coatings AU - Quintero J.H. AU - Ospina R. AU - Mello A. AU - Escobar D. AU - Restrepo-Parra E. Y1 - 2017 UR - http://hdl.handle.net/11407/4266 PB - John Wiley and Sons Ltd AB - ER - @misc{11407_4266, author = {Quintero J.H. and Ospina R. and Mello A. and Escobar D. and Restrepo-Parra E.}, title = {Influence of nitrogen partial pressure on the microstructure and morphological properties of sputtered RuN coatings}, year = {2017}, abstract = {}, url = {http://hdl.handle.net/11407/4266} }RT Generic T1 Influence of nitrogen partial pressure on the microstructure and morphological properties of sputtered RuN coatings A1 Quintero J.H. A1 Ospina R. A1 Mello A. A1 Escobar D. A1 Restrepo-Parra E. YR 2017 LK http://hdl.handle.net/11407/4266 PB John Wiley and Sons Ltd AB OL Spanish (121)
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Abstract
In this work, the production of RuN thin films using the reactive direct current magnetron sputtering technique is presented. Samples were grown with varying Ar/N2 ratio with values of 60/40, 80/20, 85/15, 90/10, 95/5, and 100/0. X-ray photoelectron spectroscopy was employed to determine the presence of RuN before and after a sputtering etching process. According to the high-resolution of N1s spectra, 3 peaks were identified at 397.4±0.3 eV, 398.3±0.3 eV, and 398.8±0.3 eV binding energies, corresponding to hybridizations of nitrogen with transition metals, oxynitrides, and oxycarbides. X-ray diffraction analyses were performed, showing the coexistence of the RuN face-centered cubic and Ru hexagonal compact packed phases. After the etching process, the samples grown at nitrogen flow rates greater than 15% continued to show the RuN face-centered cubic phase. Atomic force microscope analyses showed that as the nitrogen concentration increased, the grain size and roughness also tended to increase. © 2017 John Wiley & Sons, Ltd.
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http://hdl.handle.net/11407/4266
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