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Influence of nitrogen partial pressure on the microstructure and morphological properties of sputtered RuN coatings

dc.creatorQuintero J.H.spa
dc.creatorOspina R.spa
dc.creatorMello A.spa
dc.creatorEscobar D.spa
dc.creatorRestrepo-Parra E.spa
dc.date.accessioned2017-12-19T19:36:43Z
dc.date.available2017-12-19T19:36:43Z
dc.date.created2017
dc.identifier.issn1422421
dc.identifier.urihttp://hdl.handle.net/11407/4266
dc.description.abstractIn this work, the production of RuN thin films using the reactive direct current magnetron sputtering technique is presented. Samples were grown with varying Ar/N2 ratio with values of 60/40, 80/20, 85/15, 90/10, 95/5, and 100/0. X-ray photoelectron spectroscopy was employed to determine the presence of RuN before and after a sputtering etching process. According to the high-resolution of N1s spectra, 3 peaks were identified at 397.4±0.3 eV, 398.3±0.3 eV, and 398.8±0.3 eV binding energies, corresponding to hybridizations of nitrogen with transition metals, oxynitrides, and oxycarbides. X-ray diffraction analyses were performed, showing the coexistence of the RuN face-centered cubic and Ru hexagonal compact packed phases. After the etching process, the samples grown at nitrogen flow rates greater than 15% continued to show the RuN face-centered cubic phase. Atomic force microscope analyses showed that as the nitrogen concentration increased, the grain size and roughness also tended to increase. © 2017 John Wiley & Sons, Ltd.eng
dc.language.isoeng
dc.publisherJohn Wiley and Sons Ltdspa
dc.relation.isversionofhttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85025101401&doi=10.1002%2fsia.6256&partnerID=40&md5=bf6d196bba6162152aa4ecd7bdb91e43spa
dc.sourceScopusspa
dc.titleInfluence of nitrogen partial pressure on the microstructure and morphological properties of sputtered RuN coatingsspa
dc.typeArticle in Presseng
dc.rights.accessrightsinfo:eu-repo/semantics/restrictedAccess
dc.contributor.affiliationQuintero, J.H., Materiales Nanoestructurados y Biomodelación Universidad de Medellín Medellín Colombiaspa
dc.contributor.affiliationOspina, R., Centro Brasilero de Pesquisas Fisica-CBPF Rio de Janeiro Brazil, Laboratorio de Física del Plasma Universidad Nacional de Colombia Manizales Colombia, Escuela de Física, Centro de Materiales y Nanociencia Universidad Industrial de Santander Bucaramanga Colombiaspa
dc.contributor.affiliationMello, A., Centro Brasilero de Pesquisas Fisica-CBPF Rio de Janeiro Brazilspa
dc.contributor.affiliationEscobar, D., Laboratorio de Física del Plasma Universidad Nacional de Colombia Manizales Colombiaspa
dc.contributor.affiliationRestrepo-Parra, E., Laboratorio de Física del Plasma Universidad Nacional de Colombia Manizales Colombiaspa
dc.identifier.doi10.1002/sia.6256
dc.subject.keywordAFMeng
dc.subject.keywordNitrogen concentrationeng
dc.subject.keywordRu-Neng
dc.subject.keywordXPSeng
dc.subject.keywordXRDeng
dc.subject.keywordAtomic force microscopyeng
dc.subject.keywordBinding energyeng
dc.subject.keywordEtchingeng
dc.subject.keywordMagnetronseng
dc.subject.keywordX ray diffractioneng
dc.subject.keywordX ray diffraction analysiseng
dc.subject.keywordX ray photoelectron spectroscopyeng
dc.subject.keywordDirect current magnetron sputteringeng
dc.subject.keywordEtching processeng
dc.subject.keywordFace centered cubic phaseeng
dc.subject.keywordFace-centered cubiceng
dc.subject.keywordMorphological propertieseng
dc.subject.keywordNitrogen concentrationseng
dc.subject.keywordNitrogen flow rateseng
dc.subject.keywordNitrogen partial pressureseng
dc.subject.keywordNitrogeneng
dc.publisher.facultyFacultad de Ciencias Básicasspa
dc.abstractIn this work, the production of RuN thin films using the reactive direct current magnetron sputtering technique is presented. Samples were grown with varying Ar/N2 ratio with values of 60/40, 80/20, 85/15, 90/10, 95/5, and 100/0. X-ray photoelectron spectroscopy was employed to determine the presence of RuN before and after a sputtering etching process. According to the high-resolution of N1s spectra, 3 peaks were identified at 397.4±0.3 eV, 398.3±0.3 eV, and 398.8±0.3 eV binding energies, corresponding to hybridizations of nitrogen with transition metals, oxynitrides, and oxycarbides. X-ray diffraction analyses were performed, showing the coexistence of the RuN face-centered cubic and Ru hexagonal compact packed phases. After the etching process, the samples grown at nitrogen flow rates greater than 15% continued to show the RuN face-centered cubic phase. Atomic force microscope analyses showed that as the nitrogen concentration increased, the grain size and roughness also tended to increase. © 2017 John Wiley & Sons, Ltd.eng
dc.creator.affiliationMateriales Nanoestructurados y Biomodelación Universidad de Medellín Medellín Colombiaspa
dc.creator.affiliationCentro Brasilero de Pesquisas Fisica-CBPF Rio de Janeiro Brazilspa
dc.creator.affiliationLaboratorio de Física del Plasma Universidad Nacional de Colombia Manizales Colombiaspa
dc.creator.affiliationEscuela de Física, Centro de Materiales y Nanociencia Universidad Industrial de Santander Bucaramanga Colombiaspa
dc.relation.ispartofesSurface and Interface Analysisspa
dc.relation.ispartofesSurface and Interface Analysis Volume 49, Issue 10, October 2017, Pages 978-984spa
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dc.type.versioninfo:eu-repo/semantics/publishedVersion
dc.type.driverinfo:eu-repo/semantics/other
dc.identifier.reponamereponame:Repositorio Institucional Universidad de Medellínspa
dc.identifier.instnameinstname:Universidad de Medellínspa


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